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CdTe thin film solar cells produced using a chamberless inline process via metalorganic chemical vapour deposition

机译:使用无室在线工艺通过有机金属化学气相沉积生产的CdTe薄膜太阳能电池

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摘要

Cd1 − xZnxS and CdTe:As thin films were deposited using a recently developed chamberless inline process via metalorganic chemical vapour deposition (MOCVD) at atmospheric pressure and assessed for fabrication of CdTe photovoltaic (PV) solar cells. Initially, CdS and Cd1 − xZnxS coatings were applied onto 15 × 15 cm2 float glass substrates, characterised for their optical properties, and then used as the window layer in CdTe solar cells which were completed in a conventional MOCVD (batch) reactor. Such devices provided best conversion efficiency of 13.6% for Cd0.36Zn0.64S and 10% for CdS which compare favourably to the existing baseline MOCVD (batch reactor) devices. Next, sequential deposition of Cd0.36Zn0.64S and CdTe:As films was realised by the chamberless inline process. The chemical composition of a 1 μm CdTe:As/150 nm Cd0.36Zn0.64S bi-layer was observed via secondary ions mass spectroscopy, which showed that the key elements are uniformly distributed and the As doping level is suitable for CdTe device applications. CdTe solar cells formed using this structure provided a best efficiency of 11.8% which is promising for a reduced absorber thickness of 1.25 μm. The chamberless inline process is non-vacuum, flexible to implement and inherits from the legacy of MOCVD towards doping/alloying and low temperature operation. Thus, MOCVD enabled by the chamberless inline process is shown to be an attractive route for thin film PV applications.
机译:Cd1-xZnxS和CdTe:As薄膜是使用最近开发的无室在线工艺通过金属有机化学气相沉积(MOCVD)在大气压下沉积的,并评估了CdTe光伏(PV)太阳能电池的制造。最初,将CdS和Cd1-xZnxS涂层涂覆到15×15 cm2的浮法玻璃基板上,以其光学性能为特征,然后将其用作CdTe太阳能电池的窗口层,在常规的MOCVD(分批)反应器中完成该窗口层。这样的设备对Cd0.36Zn0.64S的最佳转换效率为13.6%,对CdS的转换效率为10%,这与现有的基准MOCVD(分批反应器)设备相比具有优势。接下来,通过无室在线工艺实现了Cd0.36Zn0.64S和CdTe:As膜的顺序沉积。通过二次离子质谱观察到1μmCdTe:As / 150 nm Cd0.36Zn0.64S双层的化学成分,表明关键元素分布均匀,As掺杂水平适合CdTe器件应用。使用这种结构形成的CdTe太阳能电池可提供11.8%的最佳效率,这有望降低1.25μm的吸收层厚度。无室在线工艺是无真空的,易于实施,并且继承了MOCVD的传统,一直到掺杂/合金化和低温操作。因此,通过无室在线工艺实现的MOCVD已被证明是薄膜PV应用的诱人途径。

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